肖特基浸没式场发射高分辨扫描电镜 分辨率：0.7nm（15kV）,0.7nm（1kV）,3.0nm（5kV、WD10MM、5nA）

1.In-lens Schottky Plus Field Emission Electron Gun:Maximum Beam Current: 20 nA 2kV / 500 nA 30 kV 2.Super Hybrid Lens (SHL) 3.Gentle Beam Super High Resolution (GBSH):Maximum sample bias voltage: -5 kV 4.Back Scattered Electron detector: RBEI detector (retractable) 5.Chamber Camera: CMOS camera system 6.Low Vacuum with secondary electron detector for LV

1.Oxford EDS : X-Max Extreme 2.Electron Beam Lithography system:Raith ELPHY Quantum