Technical Specifications • Fastest heating rate: 100C/s； • Fastest cooling rate: 60s (1000C → 100C)； • Maximum temperature: 1200C； • Temperature Precision: ±0.3C.

Application • Rapid Thermal Annealing, RTA; • Rapid Thermal Oxidation,RTO; • Rapid Thermal Nitridation,RTN; • Silicidation; • Diffusion; • Compound Semiconductor Annealing; • Implant Annealing; • Contact Alloying; • Crystallization and Densification; • Alloy melting point analysis; • Thin film deposition； • And so on…

• SS316 Stainless steel vacuum chamber + Hipace 300+ RV5 • N-light infrared fiber laser • IMPAC IGAR6 Advanced • Water-cooled sample rack • VAT all metal leakage valve + 4 gas inlet