Maximum substrate size: Single 2-inch diameter or multiple small samples. Maximum substrate temperature: 950 °C (in oxygen) for Silicon. Operating Pressure Range: 5E-8 Torr base to 500 mTorr. Target Size: Four (4) 2-inch diameter targets by 6 mm thick. Target to Substrate Distance: 50-100 mm. Laser: COMPex Pro 110. Operational Wavelength: 248-nm (KrF) Standard. Working Conditions: 220 VAC, 50 Hz, 5-25 °C, RH<70%.

PVD Product's Nano PLD-1000 is a completely integrated pulsed laser deposition tool capable of depositing multilayer and epitaxial films on substrates up to 2-inch in diameter. This complete system is designed for epitaxial thin film deposition and incorporates High pressure RHEED, a loadlock, and a COMPex Pro 110 excimer and gas cabinet.

Vacuum chamber and frame. Pumping package, vacuum gauges and gas distribution. Duel wafer pneumatic loadlock. Raster based position optical train. Lambda Physik COMPex PRO 110 Laser. Programmable 4 position target manipulator. Oxygen-resistant rotating substrate heater. Laptop computer control software.